A1000PC is a Atomic layer deposition system for large-scale industrial production. Low temperature coating design can deposit high-quality optical films on various 3D substrates.
A1000PC is a Atomic layer deposition system for large-scale industrial production. Low temperature coating design can deposit high-quality optical films on various 3D substrates.
Excellent film shape retention and adhesion on plastic substrates
Design of ALD system certified through industrial testing
Best-in-class uptime and capacity
Compatible with automated loading of substrates
Advanced Control Systems for Industry 4.0
| Size | Width 3220, length 4300, height 2800mm (also customizable) | Deposited film | Al2O3，SiO2，TiO2 | Plasma | ICP |
| Precursor source | 4 liquid 2 gas | Substrate | Planar or three-dimensional | Loading capacity | Φ335mm*40pcs |
| Process temperature | <130℃ | Film uniformity | Al2O3,SiO2 <±2%, TiO2<±3% | Loading method | Semi-automatic |
Excellent film shape retention and adhesion on plastic substrates
Design of ALD system certified through industrial testing
Best-in-class uptime and capacity
Compatible with automated loading of substrates
Advanced Control Systems for Industry 4.0
Real batch low-temperature silicon oxide deposition process
Excellent batch titanium dioxide uniformity
Can perform plasma pre-treatment on plastic lenses
High loading batch Atomic layer deposition system
Industry leading mass production equipment
Verified High Repetitive Reliability
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